Cluster SystemsModular, flexible & cost-effective

Our cluster systems are based on a platform with many modular units. Therefore, every tool can be configured according to your specific applications. On top of that, special features can be integrated to meet your demands. Thanks to this flexibility, VON ARDENNE cluster systems will help you reduce your cost of ownership.

Moduls

Load Lock

Load Lock with Magazine

Load Lock with Transfer Unit

Loading/ Unloading Station

The entry load lock chamber enables substrate loading without venting the process chambers of the system.

Different versions are available featuring single substrate storage or a substrate magazine.

A load lock with a transfer unit can optionally be equipped with a heating or/and a glow discharge module.

Pre-/Post-Treatment Chambers

The pre-treatment chambers can be fitted with components for preparing the substrate for the coating process such as: glow discharge device, inverse sputter etcher, Ion source or heater.

The heater can be combined with all the other components mentioned here.

Heater

Etching

Cooler

Coating Chambers

The coating chambers can contain different process modules.
The available coating processes are sputtering (planar or focal), thermal and e-beam evaporation and PECVD.

For sputtering, the process chambers can be used with standard VON ARDENNE planar magnetrons, magnetrons with a rotating magnetic field or third-party magnetrons, e.g. double ring magnetrons (Fraunhofer FEP).

Additional components such as heaters and measuring instruments for monitoring or controlling the process can also be integrated.

Sputtering Focal

Sputtering Planar

Evaporation

PECVD

Transfer Chambers

The transfer chambers are equipped with an automatic handling system, which enables a safe transport of the substrates and carriers through the individual chambers of the system.

For a higher throughput, 6- and 8- port chambers can be equipped with double-arm robots.