with a highly flexible process control system

VA PROCOS2
Controlling Reactive Sputtering of Compound Layers

VA PROCOS 2 is a modular process control system specifically designed for stabilizing reactive sputtering processes in critical transition mode.

It is suitable for process characterization by optical emission lines, cathode voltage, oxygen partial pressure, combinations thereof as well as further PLC signals.

In addition, it can be used to stabilize the plasma discharge and thus the product properties. This is achieved by adjusting the supply of one or more reactive gases.

VON ARDENNE has been a leader in reactive sputtering processes since 1980. In addition, we have been offering our process control system VA PROCOS for many years and have optimized it continuously.

Our current system VA PROCOS 2 controls the reactive magnetron sputtering of composite layers and provides reliable stability of the operating points at the critical transition areas. The system also reliably controls one or more inlets for reactive gases.

Would you like to learn more? Then take a look at the brochure, or contact us directly.

Benefits

Reliable: Industry-proven control for reactive sputtering

of all common layer systems

Easily configurable with external components

for all reactive sputtering application

Easy to integrate:

Designed for use in any sputtering equipment

Support
Media
The Development of Process Control Systems for Sputtering

The process control of sputter processes has a long history and many sensors and approaches have been studied and employed. But how has it been…

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Jana Schilling

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